Description
SQ-8 QuickDry is an epoxy-based negative photoresist that uses a cyclopentanone solvent system designed for the same applications as its SQ-Series covering areas like polymeric MEMS, microfluidics, micromachining and other microelectronic applications. This resist features a faster drying solvent, which reduces processing times and increases throughput for film thicknesses up to 200 microns. The plug-and-play SU-8 2000 replacement. Sticks to oxide layers.
Sensitive to NUV, i-line and broadband wavelengths. SQ™ uses superior epoxies specially designed for the electronics industry, making improvements in optical transparency, particles and filter-ability, cured surface energy consistency, and photoresist lot-to-lot consistency versus industry competitors.
Also available in 1L, 4L, and 16L. Contact us for more details.
Check out the differences between SQ Negative Resists offerings here!
