Description
KL NPR is a negative-tone novolac photoresist optimized for thick, durable patterns used in electroplating, metal deposition, through-silicon vias (TSVs), and RIE masking. The formulation supports single-coat films up to 20 µm, producing vertical sidewalls and high aspect-ratio features for reliable plating molds and etch durability. KL NPR maintains profile integrity up to 130 °C, helping protect features through subsequent thermal steps. Compatible with TMAH or KOH developers and removable with common solvents such as NMP or DMSO, KL NPR integrates seamlessly into standard wet-process modules for advanced packaging and back-end flows.
Key features
- Tone: Negative (novolac resin system)
- Exposure bands: i-line, broadband
- Film thickness: 0.75 - 20 µm
- Profile: Vertical sidewalls and high aspect-ratio features (process-dependent)
- Thermal stability: Withstands up to 130 °C without profile degradation
- Developer: Industry-standard TMAH or KOH systems
- Remover compatibility: Common removers such as NMP or DMSO
- Drop-in Replacement for: 15nXT 115CPS & 15nXT 450CPS
| Current Resist | KemLab Replacement | Approx. KemLab FT (microns) Range |
| NPR 1 | 0.75 – 1.5 | |
| NPR 2 | 1.5 – 3.0 | |
| AZ 15nXT 115CPS | NPR 4 | 3.0 – 5.0 |
| AZ 15nXT 115CPS | NPR 6 | 4.5 – 9.0 |
| AZ 15nXT 450CPS | NPR 10 | 7.0 – 20.0 |
