Description
SQ-8 QuickDry is an epoxy-based negative photoresist that uses a cyclopentanone solvent system designed for the same applications as its SQ-Series covering areas like polymeric MEMS, microfluidics, micromachining and other microelectronic applications. This resist features a faster drying solvent, which reduces processing times and increases throughput for film thicknesses up to 200 microns. The plug-and-play SU-8 2000 replacement. Sticks to oxide layers.
Suitable as a substitute to SU-8 3000 but requires some process modifications. SU-8 3000 contains additional poly-ol which helps improve adhesion and minimizes film cracking but poorer sharp feature resolution. SQ-8 QuickDry will have no issues sticking to most surfaces as long as proper cleaning and dehydration is performed
Sensitive to NUV, i-line and broadband wavelengths. SQ-8 uses superior epoxies specially designed for the electronics industry, making improvements in optical transparency, particles and filter-ability, cured surface energy consistency, and photoresist lot-to-lot consistency versus industry competitors.
Key features
- Tone: Negative
- Exposure: NUV, i-line, broadband
- Film thickness: Up to 100 µm (single coat)
- Developer: SQ-8 Developer, SU-8 PGMEA
- Performance: Superior cleanliness, transparency, and lithographic reproducibility vs. legacy SU-8
- Drop-in Replacement for: Standard SU-8 2000 & 3000 series
Check out the differences between SQ-8 Negative Resists offerings here!
