Description
SQ-8 is an epoxy-based negative photoresist with GBL solvent designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. Developed by the engineers behind everyone's favorite microfluidic photoresist, this resist features the same chemical, mechanical and thermal resistance. The plug-and-play SU-8 replacement. Does not stick to oxide.
Sensitive to NUV, i-line and broadband wavelengths. SQ-8 uses superior epoxies specially designed for the electronics industry, making improvements in optical transparency, particles and filter-ability, cured surface energy consistency, and photoresist lot-to-lot consistency versus industry competitors.
Key features
- Tone: Negative
- Exposure: NUV, i-line, broadband
- Film thickness: Up to 100 µm (single coat)
- Developer: SQ-8 Developer, SU-8 PGMEA
- Performance: Superior cleanliness, transparency, and lithographic reproducibility vs. legacy SU-8
- Drop-in Replacement for: Standard SU-8 series
Check out the differences between SQ-8 Negative Resists offerings here!
